slide No. 8 / 15

This slide shows the sputtering chamber used in this study.

This is an DC magnetron system with unbalanced magnetron, configuration. Target is copper and the discharge gas is argon.

The chamber height is 16 cm, and the diameter is about 20 cm. OES camera is shown in the left of the chamber in this figure, which focuses on above the center of the target. The camera can be moved vertically to change the distance of the focal points from the target.